Budyanskij, M. Y., Sejdman, L. A., Voronov, B. M., & Gubkina, T. O. (1992). Increase of reproducibility in production of superconducting thin films of niobium nitride. Sverkhprovodimost': Fizika, Khimiya, Tekhnika, 5(10), 1950–1954.
Abstract: Technique to control the composition of gas medium in the reactive magnetron discharge and the composition of the deposited films of niobium nitride using electrical parameters of discharge only, in particular, by δU = Up – Uar value at contant stabilized discharge current is described. Technique to select optimal condition for deposition of niobium nitride films when the films have composition meeting chemical formula, is suggested. Thin films of niobium nitride with up to 7 nm thickness and with rather high temperature of transition into superconducting state Tk > 10 K) and with low width of transition (δ < 0.6 K), are obtained. It is determined, that substrate material and dielectric sublayer do not affect. Tk value, while difference in coefficients of thermal expansion of substrate and of film affects δTk value.
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Tret’yakov, I. V., Ryabchun, S. A., Kaurova, N. S., Larionov, P. A., Lobastova, A. A., Voronov, B. M., et al. (2010). Optimum absorbed heterodyne power for superconducting NbN hot-electron bolometer mixer. Tech. Phys. Lett., 36(12), 1103–1105.
Abstract: Absorbed heterodyne power has been measured in a low-noise broadband hot-electron bolometer (HEB) mixer for the terahertz range, operating on the effect of electron heating in the resistive state of an ultrathin superconducting NbN film. It is established that the optimum absorbed heterodyne power for the HEB mixer operating at 2.5 THz is about 100 nW.
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Manova, N. N., Korneeva, Y. P., Korneev, A. A., Slysz, W., Voronov, B. M., & Gol'tsman, G. N. (2011). Superconducting NbN single-photon detector integrated with quarter-wave resonator. Tech. Phys. Lett., 37(5), 469–471.
Abstract: The spectral dependence of the quantum efficiency of superconducting NbN single-photon detectors integrated with quarter-wave resonators based on Si3N4, SiO2, and SiO layers has been studied.
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