Koshelets, V. P., Ermakov, A. B., Filippenko, L. V., Khudchenko, A. V., Kiselev, O. S., Sobolev, A. S., et al. (2007). Superconducting integrated submillimeter receiver for TELIS. IEEE Trans. Appl. Supercond., 17(2), 336–342.
|
Koshelets, V. P., Borisov, V. B., Dmitriev, P. N., Ermakov, A. B., Filippenko, L. V., Khudchenko, A. V., et al. (2006). Integrated submillimeter receiver for TELIS. Joint International Workshop “Nanosensors and Arrays of Quantum Dots and Josephson Junctions for space applications”, 10th International Workshop “From Andreev Reflection to the Earliest Universe”, .
|
Gerecht, E., Musante, C. F., Jian, H., Zhuang, Y., Yngvesson, K. S., Dickinson, J., et al. (1999). Improved characteristics of NbN HEB mixers integrated with log-periodic antennas. In Proc. 10th Int. Symp. Space Terahertz Technol. (pp. 200–207).
|
Gerecht, E., Musante, C. F., Yngvesson, K. S., Waldman, J., Gol'tsman, G. N., Yagoubov, P. A., et al. (1997). Optical coupling and conversion gain for NbN HEB mixer at THz frequencies. In Proc. 4-th Int. Semicond. Device Research Symp. (pp. 47–50).
|
Svechnikov, S. I., Okunev, O. V., Yagoubov, P. A., Gol'tsman, G. N., Voronov, B. M., Cherednichenko, S. I., et al. (1997). 2.5 THz NbN hot electron mixer with integrated tapered slot antenna. IEEE Trans. Appl. Supercond., 7(2), 3548–3551.
Abstract: A Hot Electron Bolometer (HEB) mixer for 2.5 THz utilizing a NbN thin film device, integrated with a Broken Linearly Tapered Slot Antenna (BLTSA), has been fabricated and is presently being tested. The NbN HEB device and the antenna were fabricated on a SiO2membrane. A 0.5 micrometer thick SiO2layer was grown by rf magnetron reactive sputtering on a GaAs wafer. The HEB device (phonon-cooled type) was produced as several parallel strips, 1 micrometer wide, from an ultrathin NbN film 4-7 nm thick, that was deposited onto the SiO2layer by dc magnetron reactive sputtering. The BLTSA was photoetched in a multilayer Ti-Au metallization. In order to strengthen the membrane, the front-side of the wafer was coated with a 5 micrometer thick polyimide layer just before the membrane formation. The last operation was anisotropic etching of the GaAs in a mixture of HNO3and H2O2.
|