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Polyakova, O. N., Tikhonov, V. V., Dzardanov, A. L., Boyarskii, D. A., & Gol’tsman, G. N. (2008). Dielectric characteristics of ore minerals in a 10–40 GHz frequency range. Tech. Phys. Lett., 34(11), 967–970.
Abstract: A new approach to investigation of the complex dielectric permittivity of both nonmetallic and ore minerals in the microwave frequency range is proposed. Using this approach, data on the complex permittivity of sphalerite, magnetite, and labradorite in a 10–40 GHz frequency range have been obtained for the first time. A method is proposed for calculating the complex permittivity from experimentally measured frequency dependences of the reflection and transmission coefficients of a plane-parallel plate of a given mineral. Approximate expressions that can be used for calculations of the complex refractive index and permittivity of minerals are presented.
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Prokhodtsov, A., An, P., Kovalyuk, V., Zubkova, E., Golikov, A., Korneev, A., et al. (2018). Optimization of on-chip photonic delay lines for telecom wavelengths. In J. Phys.: Conf. Ser. (Vol. 1124, 051052).
Abstract: In this work, we experimentally studied optical delay lines on silicon nitride platform for telecomm wavelength (1550 nm). We modeled the group delay time and fabricated spiral optical delay lines with different waveguide widths and radii as well as measured their transmission. For the half etched rib waveguides we achieved the losses in the range of 3 dB/cm.
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Prokhodtsov, A., Golikov, A., An, P., Kovalyuk, V., Goltsman, G., Arakelyan, S., et al. (2019). Effect of silicon oxide coating on a silicon nitride focusing grating coupler efficiency. In EPJ Web Conf. (Vol. 220, 02009).
Abstract: The dependence of the efficiency of the focusing grating couplers on the period and filling factor before and after deposition of the upper silicon oxide layer was experimentally studied. The obtained data are of practical importance for tunable integrated-optical devices based on silicon nitride platform.
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Prokhodtsov, A., Kovalyuk, V., An, P., Golikov, A., Shakhovoy, R., Sharoglazova, V., et al. (2020). Silicon nitride Mach-Zehnder interferometer for on-chip quantum random number generation. In J. Phys.: Conf. Ser. (Vol. 1695, 012118).
Abstract: In this work, we experimentally studied silicon nitride Mach-Zehnder interferometer (MZI) with two directional couplers and 400 ps optical delay line for telecom wavelength 1550 nm. We achieved the extinction ratio in a range of 0.76-13.86 dB and system coupling losses of 28-44 dB, depending on the parameters of directional couplers. The developed interferometer is promising for the use in a compact random number generator for the needs of a fully integrated quantum cryptography system, where compact design, as well as high generation speed, are needed.
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Ptitsina, N. G., Chulkova, G. M., Il’in, K. S., Sergeev, A. V., Pochinkov, F. S., Gershenzon, E. M., et al. (1997). Electron-phonon interaction in disordered metal films: The resistivity and electron dephasing rate. Phys. Rev. B, 56(16), 10089–10096.
Abstract: The temperature dependence of the resistance of films of Al, Be, and NbC with small values of the electron mean free path l=1.5–10nm has been measured at 4.2–300 K. The resistance of all the films contains a T2 contribution that is proportional to the residual resistance; this contribution has been attributed to the interference between the elastic electron scattering and the electron-phonon scattering. Fitting the data to the theory of the electron-phonon-impurity interference (M. Yu. Reiser and A. V. Sergeev, Zh. Eksp. Teor. Fiz. 92, 224 (1987) [Sov. Phys. JETP 65, 1291 (1987)]), we obtain constants of interaction of the electrons with transverse phonons, and estimate the contribution of this interaction to the electron dephasing rate in thin films of Au, Al, Be, Nb, and NbC. Our estimates are in a good agreement with the experimental data on the inelastic electron-phonon scattering in these films. This indicates that the interaction of electrons with transverse phonons controls the electron-phonon relaxation rate in thin-metal films over a broad temperature range.
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