Abstract: Millimetron is a Russian-led 12 m diameter submillimeter and far-infrared space observatory which is included in the Space Plan of the Russian Federation for launch around 2017. With its large collecting area and state-of-the-art receivers, it will enable unique science and allow at least one order of magnitude improvement with respect to the Herschel Space Observatory. Millimetron will be operated in two basic observing modes: as a single-dish observatory, and as an element of a ground-space very long baseline interferometry (VLBI) system. As single-dish, angular resolutions on the order of 3 to 12 arc sec will be achieved and spectral resolutions of up to a million employing heterodyne techniques. As VLBI antenna, the chosen elliptical orbit will provide extremely large VLBI baselines (beyond 300,000 km) resulting in micro-arc second angular resolution.

Abstract: Results of theoretical estimations and measurements of characteristics of an Andreev reflection hot-electron microbolometer for submillimeter radioastronomy made by different researchers are reviewed and analysed. Peculiarities and characteristics of the microbolometers using two types of microthermometer for measurement of the electron temperature increment under influence of the radiation: the SIN-junction and the transition-edge sensor (TES) with electrothermal feedback – are compared. Advantages of the microbolometer with the second type of the microthermometer when the TES is used simultaneously as the absorber of radiation are shown. Methods of achievement of the best noise equivalent power of the microbolometer in such version as well as methods of the matching the microbolometer with the incident radiation flow using planar antennas and with the channel of output signal measurement using a SQUID-picoammeter are considered.

Abstract: A study was made on dependence of surface resistance, critical temperature and width of superconducting transition on application temperature and thickness of NbN films, which varied within the range of 3-10 nm. Plates of sapphire, fused and monocrystalline quartz, MgO, as well as Si and silicon oxide were used as substrates. NbN films with 160 μθ·cm specific resistance and 16.5 K (Tc) critical temperature were obtained on sapphire substrates. Intensive growth of ΔTc was noted for films, applied on fused quartz, with increase of precipitation temperature. This is explained by occurrence of high tensile stresses in NbN films, caused by sufficient difference of thermal coefficients of expansion of NbN and quartz.