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Komrakova, S., Javadzade, J., Vorobyov, V., Bolshedvorskii, S., Soshenko, V., Akimov, A., et al. (2019). CMOS compatible nanoantenna-nanodiamond integration. In J. Phys.: Conf. Ser. (Vol. 1410, 012180).
Abstract: Here we demonstrate CMOS compatible method to deterministically produce nanoantenna with nanodiamonds systems on example of bull-eye antenna on top of on hyperbolic metamaterials. We study the statistics of the placement of nanodiamonds and measure the fluorescence lifetime and the second-order correlation function of NV-centers inside nanodiamonds.
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Zubkova, E., Golikov, A., An, P., Kovalyuk, V., Korneev, A., Ferrari, S., et al. (2019). CWDM demultiplexer using anti-reflection, contra-directional couplers based on silicon nitride rib waveguide. In J. Phys.: Conf. Ser. (Vol. 1410, 012179).
Abstract: We report on the development and fabrication of a 9-channel coarse wavelength-division multiplexing for telecommunication wavelengths (1550 nm) using anti-reflection contra-directional couplers, based on silicon nitride (Si3N4) rib waveguide. The transmitted and reflected spectrum in each channel of the demultiplexer were measured. The average full width at half maximum of the transmitted (reflected) spectra is about 3 nm.
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Kuzin, A., Kovalyuk, V., Golikov, A., Prokhodtsov, A., Marakhin, A., Ferrari, S., et al. (2019). Efficiency of focusing grating couplers versus taper length and angle. In J. Phys.: Conf. Ser. (Vol. 1410, 012181).
Abstract: Here we experimentally studied dependence of a focusing grating coupler efficiency versus taper length and angle on silicon nitride platform. As a result, we obtained a dependence for the efficiency of a focusing grating coupler on the parameters of the taper length and angle.
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Prokhodtsov, A., Golikov, A., An, P., Kovalyuk, V., Goltsman, G., Arakelyan, S., et al. (2019). Effect of silicon oxide coating on a silicon nitride focusing grating coupler efficiency. In EPJ Web Conf. (Vol. 220, 02009).
Abstract: The dependence of the efficiency of the focusing grating couplers on the period and filling factor before and after deposition of the upper silicon oxide layer was experimentally studied. The obtained data are of practical importance for tunable integrated-optical devices based on silicon nitride platform.
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Elmanov, I., Elmanova, A., Komrakova, S., Golikov, A., Kaurova, N., Kovalyuk, V., et al. (2019). Method for determination of resists parameters for photonic – integrated circuits e-beam lithography on silicon nitride platform. In EPJ Web Conf. (Vol. 220, 03012).
Abstract: In the work the thicknesses of the e-beam resists ZEP 520A and ma-N 2400 by using non-destructive method were measured, as well as recipe for the high ratio between the Si3N4 and the resists etching rate was determined. The work has a practical application for e-beam lithography of photonic-integrated circuits and nanophotonics devices based on silicon nitride platform.
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