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Hong, K., Marsh, P. F., Geok-Ing Ng, Pavlidis, D., & Hong, C. - H. (1994). Optimization of MOVPE grown InxAl1-xAs/In0.53Ga0.47As planar heteroepitaxial Schottky diodes for terahertz applications. IEEE Trans. Electron Devices, 41(9), 1489–1497.
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Matsushima, F., Odashima, H., Iwasaki, T., Tsunekawa, S., & Takagi, K. (1994). Frequency measurement of pure rotational transitions of H2O from 0.5 to 5 THz. In Conference on precision electromagnetic measurements digest (pp. 23–24).
Abstract: Frequencies of H2O pure rotational transitions from 0.5 to 5 THz have been measured with an accuracy of one part in 109 using a tunable far-infrared spectrometer. Measured frequencies of more than a hundred spectral lines provide an excellent wavelength and frequency calibration standard for the far infrared.
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Dzardanov, A., Ekstrom, H., Gershenzon, E., Gol'tsman, G., Jacobsson, S., Karasik, B., et al. (1994). Hot-electron superconducting mixers for 20-500 GHz operation. In Proc. Int. Conf. on Millimeter and Submillimeter Waves and Appl. (Vol. 2250, pp. 276–278).
Abstract: Bolometdcmucers based on Nb and NbN superconducting thin films in the resistive state have been prepared for 20, 100 GHz and 350-500 GHz operation. The mixing mechanism is presumably of electron heating origin. Our measurements indicate that a conversion loss of about 6-8 dB can rather easily be achieved, and that the noise is reasonably low. The requirements on the operation mode and on the film parameters in order to obtain small conversion losses or even gain are discussed. For NbN films the availability of nearly 1 GHz IF bandwidth is experimentally demonstrated. NbN hot-electron mucers combined with slot-line tapered antenna on Si membrane or with double-dipole antenna on SiO^ substrate have been fabricated. The devices we study are considered to be very promising for use in heterodyne receivers from microwaves to terahertz frequencies.
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Heslinga, D. R., Shafranjuk, S. E., van Kempen, H., & Klapwijk, T. M. (1994). Observation of double-gap-edge Andreev reflection at Si/Nb interfaces by point-contact spectroscopy. Phys. Rev. B, 49(15), 10484–10494.
Abstract: Andreev reflection point-contact spectroscopy is performed on a bilayer consisting of 50-nm degenerately doped Si backed with Nb. Due to the short mean free path both injection into and transport across the Si layer are diffusive, in contrast to the ballistic conditions prevailing in clean metal layers. Nevertheless a large Andreev signal is observed in the point-contact characteristics, not reduced by elastic scattering in the Si layer or by interface scattering, but only limited by the transmission coefficient of the metal-semiconductor point contact. Two peaks in the Andreev reflection probability are visible, marking the values of the superconducting energy gap at the interface on the Nb and Si sides. This interpretation is supported by a method of solving the Bogolubov equations analytically using a simplified expression for the variation of the order parameter close to the interface. This observation enables a comparison with theoretical predictions of the gap discontinuity in the proximity effect. It is found that the widely used de Gennes model does not agree with the experimental data.
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Voronov, B. M., Gershenzon, E. M., Gol'tsman, G. N., Gubkina, T. O., & Semash, V. D. (1994). Superconductive properties of ultrathin NbN films on different substrates. Sverkhprovodimost': Fizika, Khimiya, Tekhnika, 7(6), 1097–1102.
Abstract: A study was made on dependence of surface resistance, critical temperature and width of superconducting transition on application temperature and thickness of NbN films, which varied within the range of 3-10 nm. Plates of sapphire, fused and monocrystalline quartz, MgO, as well as Si and silicon oxide were used as substrates. NbN films with 160 μθ·cm specific resistance and 16.5 K (Tc) critical temperature were obtained on sapphire substrates. Intensive growth of ΔTc was noted for films, applied on fused quartz, with increase of precipitation temperature. This is explained by occurrence of high tensile stresses in NbN films, caused by sufficient difference of thermal coefficients of expansion of NbN and quartz.
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