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Blundell, R.; Barrett, J.; H. Gibson, C. Gotteib; Hunter, T.; Kimberk, R.; Leiker, S.; Marrone, D.; Meledin, D.; Paine, S.; Papa, D. C.; Plante, R.; Riddle, P.; Smith, M.; Sridharan, T.; Tong, C. E.; Wilson, R.; Diaz, M.; Bronfman, L.; May, J.; Otarola, A.; Radford, S. J. |
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Title |
Prospects for terahertz radio astronomy from Northean Chile |
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Conference Article |
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2002 |
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Proc. 13th Int. Symp. Space Terahertz Technol. |
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159-166 |
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Cambridge, MA, USA |
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Harvard university |
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RPLAB @ s @ meledin_2p5_stability |
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327 |
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Baryshev, A.; Lauria, E.; Hesper, R.; Zijlstra, T.; Wild, W. |
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Title |
Fixed-tuned waveguide 0.6 THz SIS mixer with wide band IF |
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Conference Article |
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Year |
2002 |
Publication |
Proc. 13th Int. Symp. Space Terahertz Technol. |
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1-9 |
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Cambridge, MA, USA |
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Harward University |
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RPLAB @ s @ nt_SIS_136at0p65THz |
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328 |
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Shytov, A. V.; Levitov, L. S.; Beenakker, C. W. J. |
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Title |
Electromechanical noise in a diffusive conductor |
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Journal Article |
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Year |
2002 |
Publication |
Phys. Rev. Lett. |
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Phys. Rev. Lett. |
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88 |
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22 |
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Electrons moving in a conductor can transfer momentum to the lattice via collisions with impurities and boundaries, giving rise to a fluctuating mechanical stress tensor. The root-mean-squared momentum transfer per scattering event in a disordered metal (of dimension L greater than the mean free path l and screening length xi) is found to be reduced below the Fermi momentum by a factor of order l/L for shear fluctuations and (xi/L)^2 for pressure fluctuations. The excitation of an elastic bending mode by the shear fluctuations is estimated to fall within current experimental sensitivity for a nanomechanical oscillator. |
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0031-9007 |
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RPLAB @ s @ |
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433 |
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Ediss, G. A.; Koller, D. |
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68.5 to 118 GHz measurements of possible infrared filter materials: black polyethylene, Zitex, and grooved and un-grooved fluorogold and HDPE |
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Miscellaneous |
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2002 |
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ALMA Memo |
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412 |
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RPLAB @ s @ |
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446 |
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Author |
Norton, P. |
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Title |
HgCdTe infrared detectors |
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Journal Article |
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Year |
2002 |
Publication |
Opto-Electronics Review |
Abbreviated Journal |
Opto-Electron. Rev. |
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10 |
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3 |
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159-174 |
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458 |
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