Il'in, K. S., Karasik, B. S., Ptitsina, N. G., Sergeev, A. V., Gol'tsman, G. N., Gershenzon, E. M., et al. (1996). Electron-phonon-impurity interference in thin NbC films: electron inelastic scattering time and corrections to resistivity. In Czech. J. Phys. (Vol. 46, pp. 857–858).
Abstract: Complex study of transport properties of impure NbC films with the electron mean free pathl=0.6–13 nm show the crucial role of the electron-phonon-impurity interference (EPII). In the temperature range 20–70 K we found the interference correction to resistivity proportional to T2 and to the residual resistivity of the film. Using the comprehensive theory of EPII, we determine the electron coupling with transverse phonons and calculate the electron inelastic scattering time. Direct measurements of the inelastic electron scattering time using a response to a high-frequency amplitude modulated cw radiation agree well with the theory.
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Lobanov, Y. V., Shcherbatenko, M. L., Semenov, A. V., Kovalyuk, V. V., Korneev, A. A., Goltsman, G. N., et al. (2017). Heterodyne spectroscopy with superconducting single-photon detector. In EPJ Web Conf. (Vol. 132, 01005).
Abstract: We demonstrate successful operation of a Superconducting Single Photon Detector (SSPD) as the core element in a heterodyne receiver. Irradiating the SSPD by both a local oscillator power and signal power simultaneously, we observed beat signal at the intermediate frequency of a few MHz. Gain bandwidth was found to coincide with the detector single pulse width, where the latter depends on the detector kinetic inductance, determined by the superconducting nanowire length.
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Prokhodtsov, A., Golikov, A., An, P., Kovalyuk, V., Goltsman, G., Arakelyan, S., et al. (2019). Effect of silicon oxide coating on a silicon nitride focusing grating coupler efficiency. In EPJ Web Conf. (Vol. 220, 02009).
Abstract: The dependence of the efficiency of the focusing grating couplers on the period and filling factor before and after deposition of the upper silicon oxide layer was experimentally studied. The obtained data are of practical importance for tunable integrated-optical devices based on silicon nitride platform.
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Elmanov, I., Elmanova, A., Komrakova, S., Golikov, A., Kaurova, N., Kovalyuk, V., et al. (2019). Method for determination of resists parameters for photonic – integrated circuits e-beam lithography on silicon nitride platform. In EPJ Web Conf. (Vol. 220, 03012).
Abstract: In the work the thicknesses of the e-beam resists ZEP 520A and ma-N 2400 by using non-destructive method were measured, as well as recipe for the high ratio between the Si3N4 and the resists etching rate was determined. The work has a practical application for e-beam lithography of photonic-integrated circuits and nanophotonics devices based on silicon nitride platform.
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Elmanova, A., Elmanov, I., Komrakova, S., Golikov, A., Javadzade, J., Vorobyev, V., et al. (2019). Integration of nanodiamonds with NV-centers on optical silicon nitride structures. In EPJ Web Conf. (Vol. 220, 03013).
Abstract: In this work we had developed optical structures from silicon nitride for further integration of the nanodiamonds containing NV-centers with them. We have introduced method of the nanodiamonds solution application on the substrates. The work has practical meaning in nanophotonics sphere and in development of optical devices with single-photon sources.
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