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Saveskul NA, Titova NA, Baeva EM, Semenov AV, Lubenchenko AV, Saha S, et al. Superconductivity behavior in epitaxial TiN films points at surface magnetic disorder [Internet].; 2019 [cited 2024 Jun 20].arXiv:1903.05009v3 [cond-mat.mtrl-sci]. Available from: https://arxiv.org/abs/1903.05009v3
Abstract: We analyze the evolution of the normal and superconducting electronic properties in epitaxial TiN films, characterized by high Ioffe-Regel parameter values, as a function of the film thickness. As the film thickness decreases, we observe an increase of in the residual resistivity, which becomes dominated by diffusive surface scattering for d≤20nm. At the same time, a substantial thickness-dependent reduction of the superconducting critical temperature is observed compared to the bulk TiN value. In such a high quality material films, this effect can be explained by a weak magnetic disorder residing in the surface layer with a characteristic magnetic defect density of ∼1012cm−2. Our results suggest that surface magnetic disorder is generally present in oxidized TiN films.
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Saveskul NA, Titova NA, Baeva EM, Semenov AV, Lubenchenko AV, Saha S, et al. Superconductivity behavior in epitaxial TiN films points to surface magnetic disorder. Phys Rev Applied. 2019;12(5):054001.
Abstract: We analyze the evolution of the normal and superconducting properties of epitaxial TiN films, characterized by high Ioffe-Regel parameter values, as a function of the film thickness. As the film thickness decreases, we observe an increase of the residual resistivity, that becomes dominated by diffusive surface scattering for d≤20nm. At the same time, a substantial thickness-dependent reduction of the superconducting critical temperature is observed compared to the bulk TiN value. In such high-quality material films, this effect can be explained by a weak magnetic disorder residing in the surface layer with a characteristic magnetic defect density of approximately 1012cm−2. Our results suggest that surface magnetic disorder is generally present in oxidized TiN films.
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Zolotov PI, Divochiy AV, Vakhtomin YB, Lubenchenko AV, Morozov PV, Shurkaeva IV, et al. Influence of sputtering parameters on the main characteristics of ultra-thin vanadium nitride films. In: J. Phys.: Conf. Ser. Vol 1124.; 2018. 051030.
Abstract: We researched the relation between deposition and ultra-thin VN films parameters. To conduct the experimental study we varied substrate temperature, Ar and N2 partial pressures and deposition rate. The study allowed us to obtain the films with close to the bulk values transition temperatures and implement such samples in order to fabricate superconducting single-photon detectors.
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