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Belitsky VY, Tarasov MA. SIS junction reactance complete compensation. IEEE Trans. Magn.. 1991;27(2):2638–41.
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Belitsky VY, Kollberg EL. Tuning circuit for NbN SIS mixer. In: Proc. 7th Int. Symp. Space Terahertz Technol. Charlottesville, Virginia, USA; 1996. 234.
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Risacher C, Meledin D, Belitsky V, Bergman P. First 1.3 THz observations at the APEX telescope. In: Proc. 20th Int. Symp. Space Terahertz Technol.; 2009. p. 54–61.
Abstract: The Atacama Pathfinder EXperiment (APEX) 12m telescope is operating on the Llano Chajnantor, Chile, since 2003 and a set of state of the art sub-millimeter receivers have been installed for frequencies spanning from 150 GHz to 1500 GHz. In 2008, a balanced 1.3 THz Hot Electron Bolometer (HEB) receiver was installed for the atmospheric window 1250-1380 GHz. This instrument is part of a 4-channel receiver cryostat with the other channels being 211-275 GHz, 275-370 GHz and 380-500 GHz Sideband Separating (SSB) SIS receivers. This paper presents the first observations obtained so far with the 1.3 THz band during its first months of operation. The sky measurements were taken during opportunistic commissioning and science verification phases, when the weather conditions were sufficiently good with a Precipitable Water Vapor (PWV) below 0.25 mm, which was the case only a few nights during these months. We present the first observations of the molecular transition CO J=(11-10) line on different sources such as Orion-FIR4, CW-Leo and SgrB2(M). We describe the many challenges and difficulties encountered for achieving successful THz observations from a large sub-millimeter ground-based telescope.
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Antipov S, Trifonov A, Krause S, Meledin D, Desmaris V, Belitsky V, et al. Gain bandwidth of NbN HEB mixers on GaN buffer layer operating at 2 THz local oscillator frequency. In: Proc. 28th Int. Symp. Space Terahertz Technol.; 2017. p. 147–8.
Abstract: In this paper, we present IF bandwidth measurement results of NbN HEB mixers, which are employing NbN thin films grown on a GaN buffer-layer. The HEB mixers were operated in the heterodyne regime at a bath temperature of approximately 4.5 K and with a local oscillator operating at a frequency of 2 THz. A quantum cascade laser served as the local oscillator and a reference synthesizer based on a BWO generator (130-160 GHz) and a semiconductor superlattice (SSL) frequency multiplier was used as a signal source. By changing the LO frequency it was possible to record the IF response or gain bandwidth of the HEB with a spectrum analyzer at the operation point, which yielded lowest noise temperature. The gain bandwidth that was recorded in the heterodyne regime at 2 THz amounts to approximately 5 GHz and coincides well with a measurement that has been performed at elevated bath temperatures and lower LO frequency of 140 GHz. These findings strongly support that by using a GaN buffer-layer the phonon escape time of NbN HEBs can be significantly lower as compared to e.g. Si substrate, thus, providing higher gain bandwidth.
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Krause S, Mityashkin V, Antipov S, Gol'tsman G, Meledin D, Desmaris V, et al. Study of IF bandwidth of NbN hot electron bolometers on GaN buffer layer using a direct measurement method. In: Proc. 27th Int. Symp. Space Terahertz Technol.; 2016. p. 30–2.
Abstract: In this paper, we present a reliable measurement method to study the influence of the GaN buffer layer on phonon-escape time in comparison with commonly used Si substrates and, in consequence, on the IF bandwidth of HEBs. One of the key aspects is to operate the HEB mixer at elevated bath temperatures close to the critical temperature of the NbN ultra-thin film, where contributions from electron-phonon processes and self-heating effects are relatively small, therefore IF roll-off will be governed by the phonon-escape.Two independent experiments were performed at GARD and MSPU on a similar experimental setup at frequencies of approximately 180 and 140 GHz, respectively, and have shown reproducible and consistent results. The entire IF chain was characterized by S-parameter measurements. We compared the measurement results of epitaxial NbN grown onto GaN buffer-layer with Tc of 12.5 K (4.5nm) with high quality polycrystalline NbN films on Si substrate with Tc of 10.5K (5nm) and observed a strong indication of an enhancement of phonon escape to the substrate by a factor of two for the NbN/GaN material combination.
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