Zubkova E, Golikov A, An P, Kovalyuk V, Korneev A, Ferrari S, et al. CWDM demultiplexer using anti-reflection, contra-directional couplers based on silicon nitride rib waveguide. In: J. Phys.: Conf. Ser. Vol 1410.; 2019. 012179.
Abstract: We report on the development and fabrication of a 9-channel coarse wavelength-division multiplexing for telecommunication wavelengths (1550 nm) using anti-reflection contra-directional couplers, based on silicon nitride (Si3N4) rib waveguide. The transmitted and reflected spectrum in each channel of the demultiplexer were measured. The average full width at half maximum of the transmitted (reflected) spectra is about 3 nm.
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Kuzin A, Kovalyuk V, Golikov A, Prokhodtsov A, Marakhin A, Ferrari S, et al. Efficiency of focusing grating couplers versus taper length and angle. In: J. Phys.: Conf. Ser. Vol 1410.; 2019. 012181.
Abstract: Here we experimentally studied dependence of a focusing grating coupler efficiency versus taper length and angle on silicon nitride platform. As a result, we obtained a dependence for the efficiency of a focusing grating coupler on the parameters of the taper length and angle.
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Prokhodtsov A, Golikov A, An P, Kovalyuk V, Goltsman G, Arakelyan S, et al. Effect of silicon oxide coating on a silicon nitride focusing grating coupler efficiency. In: EPJ Web Conf. Vol 220.; 2019. 02009.
Abstract: The dependence of the efficiency of the focusing grating couplers on the period and filling factor before and after deposition of the upper silicon oxide layer was experimentally studied. The obtained data are of practical importance for tunable integrated-optical devices based on silicon nitride platform.
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Elmanov I, Elmanova A, Komrakova S, Golikov A, Kaurova N, Kovalyuk V, et al. Method for determination of resists parameters for photonic – integrated circuits e-beam lithography on silicon nitride platform. In: EPJ Web Conf. Vol 220.; 2019. 03012.
Abstract: In the work the thicknesses of the e-beam resists ZEP 520A and ma-N 2400 by using non-destructive method were measured, as well as recipe for the high ratio between the Si3N4 and the resists etching rate was determined. The work has a practical application for e-beam lithography of photonic-integrated circuits and nanophotonics devices based on silicon nitride platform.
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Elmanova A, Elmanov I, Komrakova S, Golikov A, Javadzade J, Vorobyev V, et al. Integration of nanodiamonds with NV-centers on optical silicon nitride structures. In: EPJ Web Conf. Vol 220.; 2019. 03013.
Abstract: In this work we had developed optical structures from silicon nitride for further integration of the nanodiamonds containing NV-centers with them. We have introduced method of the nanodiamonds solution application on the substrates. The work has practical meaning in nanophotonics sphere and in development of optical devices with single-photon sources.
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