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Korneev A, Minaeva O, Divochiy A, Antipov A, Kaurova N, Seleznev V, et al. Ultrafast and high quantum efficiency large-area superconducting single-photon detectors. In: Dusek M, Hillery MS, Schleich WP, Prochazka I, Migdall AL, Pauchard A, editors. Proc. SPIE. Vol 6583. Spie; 2007. 65830I (1 to 9).
Abstract: We present our latest generation of superconducting single-photon detectors (SSPDs) patterned from 4-nm-thick NbN films, as meander-shaped 0.5-mm-long and 100-nm-wide stripes. The SSPDs exhibit excellent performance parameters in the visible-to-near-infrared radiation wavelengths: quantum efficiency (QE) of our best devices approaches a saturation level of 30% even at 4.2 K (limited by the NbN film optical absorption) and dark counts as low as 2x10-4 Hz. The presented SSPDs were designed to maintain the QE of large-active-area devices, but, unless our earlier SSPDs, hampered by a significant kinetic inductance and a nanosecond response time, they are characterized by a low inductance and GHz counting rates. We have designed, simulated, and tested the structures consisting of several, connected in parallel, meander sections, each having a resistor connected in series. Such new, multi-element geometry led to a significant decrease of the device kinetic inductance without the decrease of its active area and QE. The presented improvement in the SSPD performance makes our detectors most attractive for high-speed quantum communications and quantum cryptography applications.
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Goltsman GN. Ultrafast nanowire superconducting single-photon detector with photon number resolving capability. In: Arakawa Y, Sasaki M, Sotobayashi H, editors. Proc. SPIE. Vol 7236. SPIE; 2009. 72360D (1 to 11).
Abstract: In this paper we present a review of the state-of-the-art superconducting single-photon detector (SSPD), its characterization and applications. We also present here the next step in the development of SSPD, i.e. photon-number resolving SSPD which simultaneously features GHz counting rate. We have demonstrated resolution up to 4 photons with quantum efficiency of 2.5% and 300 ps response pulse duration providing very short dead time.
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Il'in K, Siegel M, Semenov A, Engel A, Hübers H-W, Hollmann E, et al. Thickness dependence of superconducting properties of ultrathin Nb and NbN films. In: AKF-Frühjahrstagung.; 2004.
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Budyanskij MY, Sejdman LA, Voronov BM, Gubkina TO. Increase of reproducibility in production of superconducting thin films of niobium nitride. Sverkhprovodimost': Fizika, Khimiya, Tekhnika. 1992;5(10):1950–4.
Abstract: Technique to control the composition of gas medium in the reactive magnetron discharge and the composition of the deposited films of niobium nitride using electrical parameters of discharge only, in particular, by δU = Up – Uar value at contant stabilized discharge current is described. Technique to select optimal condition for deposition of niobium nitride films when the films have composition meeting chemical formula, is suggested. Thin films of niobium nitride with up to 7 nm thickness and with rather high temperature of transition into superconducting state Tk > 10 K) and with low width of transition (δ < 0.6 K), are obtained. It is determined, that substrate material and dielectric sublayer do not affect. Tk value, while difference in coefficients of thermal expansion of substrate and of film affects δTk value.
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Voronov BM, Gershenzon EM, Gol'tsman GN, Gubkina TO, Semash VD. Superconductive properties of ultrathin NbN films on different substrates. Sverkhprovodimost': Fizika, Khimiya, Tekhnika. 1994;7(6):1097–102.
Abstract: A study was made on dependence of surface resistance, critical temperature and width of superconducting transition on application temperature and thickness of NbN films, which varied within the range of 3-10 nm. Plates of sapphire, fused and monocrystalline quartz, MgO, as well as Si and silicon oxide were used as substrates. NbN films with 160 μθ·cm specific resistance and 16.5 K (Tc) critical temperature were obtained on sapphire substrates. Intensive growth of ΔTc was noted for films, applied on fused quartz, with increase of precipitation temperature. This is explained by occurrence of high tensile stresses in NbN films, caused by sufficient difference of thermal coefficients of expansion of NbN and quartz.
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