Manova NN, Smirnov EO, Korneeva YP, Korneev AA, Goltsman GN. Superconducting photon counter for nanophotonics applications. In: J. Phys.: Conf. Ser. Vol 1410.; 2019. 012147 (1 to 5).
Abstract: We develop large area superconducting single-photon detector SSPD with a micron-wide strip suitable for free-space coupling or packaging with multi-mode optical fibres. The detector sensitive area is 20 μm in diameter. In near infrared (1330 nm wavelength) our SSPD exhibits above 30% detection efficiency with low dark counts and 45 ps timing jitter.
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Baksheeva K, Vdovydchenko A, Gorshkov K, Ozhegov R, Kinev N, Koshelets V, et al. Study of human skin radiation in the terahertz frequency range. In: J. Phys.: Conf. Ser. Vol 1410.; 2019. 012076 (1 to 5).
Abstract: The radiation of human skin in the terahertz frequency range under the influence of mental stresses has been studied in the current work. An experimental setup for observation of changes in human skin radiation, which occur under the influence of psychological stresses, by means of a superconducting integrated receiver has been developed. More than 30 volunteers participate in these studies, which allows us to verify presence of correlation between the signals from the superconducting integrated terahertz receiver and other sensors that monitor human mental stress.
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Polyakova MI, Florya IN, Semenov AV, Korneev AA, Goltsman GN. Extracting hot-spot correlation length from SNSPD tomography data. In: J. Phys.: Conf. Ser. Vol 1410.; 2019. 012166 (1 to 4).
Abstract: We present data of quantum detector tomography for the samples specifically optimized for this problem. Using this method, we take results of hot-spot correlation length of 17 ± 2 nm.
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Prokhodtsov A, Golikov A, An P, Kovalyuk V, Goltsman G, Arakelyan S, et al. Effect of silicon oxide coating on a silicon nitride focusing grating coupler efficiency. In: EPJ Web Conf. Vol 220.; 2019. 02009.
Abstract: The dependence of the efficiency of the focusing grating couplers on the period and filling factor before and after deposition of the upper silicon oxide layer was experimentally studied. The obtained data are of practical importance for tunable integrated-optical devices based on silicon nitride platform.
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Elmanov I, Elmanova A, Komrakova S, Golikov A, Kaurova N, Kovalyuk V, et al. Method for determination of resists parameters for photonic – integrated circuits e-beam lithography on silicon nitride platform. In: EPJ Web Conf. Vol 220.; 2019. 03012.
Abstract: In the work the thicknesses of the e-beam resists ZEP 520A and ma-N 2400 by using non-destructive method were measured, as well as recipe for the high ratio between the Si3N4 and the resists etching rate was determined. The work has a practical application for e-beam lithography of photonic-integrated circuits and nanophotonics devices based on silicon nitride platform.
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