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Author  |
Sidorova, M.; Semenov, A.; Korneev, A.; Chulkova, G.; Korneeva, Y.; Mikhailov, M.; Devizenko, A.; Kozorezov, A.; Goltsman, G. | ||||
| Title | Electron-phonon relaxation time in ultrathin tungsten silicon film | Type | Miscellaneous | ||
| Year | 2018 | Publication | arXiv | Abbreviated Journal | |
| Volume | Issue | Pages | |||
| Keywords | WSi film | ||||
| Abstract | Using amplitude-modulated absorption of sub-THz radiation (AMAR) method, we studied electron-phonon relaxation in thin disordered films of tungsten silicide. We found a response time ~ 800 ps at critical temperature Tc = 3.4 K, which scales as minus 3 in the temperature range from 1.8 to 3.4 K. We discuss mechanisms, which can result in a strong phonon bottle-neck effect in a few nanometers thick film and yield a substantial difference between the measured time, characterizing response at modulation frequency, and the inelastic electron-phonon relaxation time. We estimate the electron-phonon relaxation time to be in the range ~ 100-200 ps at 3.4 K. | ||||
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| Notes | Duplicated as 1341 | Approved | no | ||
| Call Number | Serial | 1340 | |||
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