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			<title>Individual SWCNT transistor with photosensitive planar junction induced by two‐photon oxidation</title>
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			<namePart type="family">Emelianov</namePart>
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			<namePart type="family">Nekrasov</namePart>
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			<namePart type="family">Moskotin</namePart>
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			<namePart type="family">Fedorov</namePart>
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			<namePart type="family">Afinogenov</namePart>
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			<namePart type="family">Nasibulin</namePart>
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			<namePart type="family">Bobrinetskiy</namePart>
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			<dateIssued>2021</dateIssued>
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		<abstract>The fabrication of planar junctions in carbon nanomaterials is a promising way to increase the optical sensitivity of optoelectronic nanometer-scale devices in photonic connections, sensors, and photovoltaics. Utilizing a unique lithography approach based on direct femtosecond laser processing, a fast and easy technique for modification of single-walled carbon nanotube (SWCNT) optoelectronic properties through localized two-photon oxidation is developed. It results in a novel approach of quasimetallic to semiconducting nanotube conversion so that metal/semiconductor planar junction is formed via local laser patterning. The fabricated planar junction in the field-effect transistors based on individual SWCNT drastically increases the photoresponse of such devices. The broadband photoresponsivity of the two-photon oxidized structures reaches the value of 2 × 107 A W−1 per single SWCNT at 1 V bias voltage. The SWCNT-based transistors with induced metal/semiconductor planar junction can be applied to detect extremely small light intensities with high spatial resolution in photovoltaics, integrated circuits, and telecommunication applications.</abstract>
		<subject>
			<topic>SWCNT transistors</topic>
		</subject>
		<note>exported from refbase (https://db.rplab.ru/refbase/show.php?record=1843), last updated on Thu, 12 Aug 2021 20:08:20 +0000</note>
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			<url>https://onlinelibrary.wiley.com/doi/10.1002/aelm.202000872</url>
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		<identifier type="uri">https://onlinelibrary.wiley.com/doi/10.1002/aelm.202000872</identifier>
		<identifier type="doi">10.1002/aelm.202000872</identifier>
		<identifier type="citekey">Emelianov_etal2021</identifier>
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			<titleInfo>
				<title>Adv. Electron. Mater.</title>
			</titleInfo>
			<titleInfo type="abbreviated">
				<title>Adv. Electron. Mater.</title>
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			<originInfo>
				<dateIssued>2021</dateIssued>
				<issuance>continuing</issuance>
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			<genre authority="marcgt">periodical</genre>
			<genre>academic journal</genre>
			<part>
				<detail type="volume">
					<number>7</number>
				</detail>
				<detail type="issue">
					<number>3</number>
				</detail>
				<detail type="page">
					<number>2000872</number>
				</detail>
			</part>
			<identifier type="issn">2199-160X</identifier>
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