Cherednichenko, S., Khosropanah, P., Adam, A., Merkel, H. F., Kollberg, E. L., Loudkov, D., et al. (2003). 1.4- to 1.7-THz NbN hot-electron bolometer mixer for the Herschel space observatory. In T. G. Phillips, & J. Zmuidzinas (Eds.), Proc. SPIE (Vol. 4855, pp. 361–370). SPIE.
Abstract: NbN hot- electron bolometer mixers have reached the level of 10hv/k in terms of the input noise temperature with the noise bandwidth of 4-6 GHz from subMM band up to 2.5 THz. In this paper we discuss the major characteristics of this kind of receiver, i.e. the gain and the noise bandwidth, the noise temperature in a wide RF band, bias regimes and optimisation of RF coupling to the quasioptical mixer. We present the status of the development of the mixer for Band 6 Low for Herschel Telescope.
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Cherednichenko, S., Kroug, M., Merkel, H., Khosropanah, P., Adam, A., Kollberg, E., et al. (2002). 1.6 THz heterodyne receiver for the far infrared space telescope. Phys. C: Supercond., 372-376, 427–431.
Abstract: A low noise heterodyne receiver is being developed for the terahertz range using a phonon-cooled hot-electron bolometric mixer based on 3.5 nm thick superconducting NbN film. In the 1–2 GHz intermediate frequency band the double-sideband receiver noise temperature was 450 K at 0.6 THz, 700 K at 1.6 THz and 1100 K at 2.5 THz. In the 3–8 GHz IF band the lowest receiver noise temperature was 700 K at 0.6 THz, 1500 K at 1.6 THz and 3000 K at 2.5 THz while it increased by a factor of 3 towards 8 GHz.
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Semenov, A. D., Hübers, H. - W., Richter, H., Birk, M., Krocka, M., Mair, U., et al. (2002). 2.5 THz heterodyne receiver with NbN hot-electron-bolometer mixer. Phys. C: Supercond., 372-376, 448–453.
Abstract: We describe a 2.5 THz heterodyne receiver for applications in astronomy and atmospheric research. The receiver employs a superconducting NbN phonon-cooled hot-electron-bolometer mixer and an optically pumped far-infrared gas laser as local oscillator. 2200 K double sideband mixer noise temperature was measured at 2.5 THz across a 1 GHz intermediate frequency bandwidth centred at 1.5 GHz. The total conversion losses were 17 dB. The mixer response was linear at load temperatures smaller than 400 K. The receiver was tested in the laboratory environment by measuring the methanol line in emission. Observed pressure broadening confirms the true heterodyne detection regime of the mixer.
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Cherednichenko, S., Drakinskiy, V., Baubert, J., Lecomte, B., Dauplay, F., Krieg, J. M., et al. (2006). 2.5 THz multipixel heterodyne receiver based on NbN HEB mixers. In Proc. SPIE (Vol. 6275, 62750I (1 to 11)).
Abstract: A 16 pixel heterodyne receiver for 2.5 THz has been developed based on NbN superconducting hot-electron bolometer (HEB) mixers. The receiver uses a quasioptical RF coupling approach where HEB mixers are integrated into double dipole antennas on 1.5 µm thick Si3N4/SiO2 membranes. Spherical mirrors (one per pixel) and backshort distance from the antenna have been used to design the output mixer beam profile. The camera design allows all 16 pixel IF readout in parallel. The gain bandwidth of the HEB mixers on Si3N4/SiO2 membranes was found to be 0.7÷0.9 GHz, which is much smaller than for similar devices on silicon. Application of buffer layers and use of alternative types of membranes (e.g. silicon-on-insulator) is under investigation.
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Svechnikov, S. I., Okunev, O. V., Yagoubov, P. A., Gol'tsman, G. N., Voronov, B. M., Cherednichenko, S. I., et al. (1997). 2.5 THz NbN hot electron mixer with integrated tapered slot antenna. IEEE Trans. Appl. Supercond., 7(2), 3548–3551.
Abstract: A Hot Electron Bolometer (HEB) mixer for 2.5 THz utilizing a NbN thin film device, integrated with a Broken Linearly Tapered Slot Antenna (BLTSA), has been fabricated and is presently being tested. The NbN HEB device and the antenna were fabricated on a SiO2membrane. A 0.5 micrometer thick SiO2layer was grown by rf magnetron reactive sputtering on a GaAs wafer. The HEB device (phonon-cooled type) was produced as several parallel strips, 1 micrometer wide, from an ultrathin NbN film 4-7 nm thick, that was deposited onto the SiO2layer by dc magnetron reactive sputtering. The BLTSA was photoetched in a multilayer Ti-Au metallization. In order to strengthen the membrane, the front-side of the wafer was coated with a 5 micrometer thick polyimide layer just before the membrane formation. The last operation was anisotropic etching of the GaAs in a mixture of HNO3and H2O2.
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