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Kovalyuk, V., Hartmann, W., Kahl, O., Kaurova, N., Korneev, A., Goltsman, G., et al. (2013). Absorption engineering of NbN nanowires deposited on silicon nitride nanophotonic circuits. Opt. Express, 21(19), 22683–22692.
Abstract: We investigate the absorption properties of U-shaped niobium nitride (NbN) nanowires atop nanophotonic circuits. Nanowires as narrow as 20nm are realized in direct contact with Si3N4 waveguides and their absorption properties are extracted through balanced measurements. We perform a full characterization of the absorption coefficient in dependence of length, width and separation of the fabricated nanowires, as well as for waveguides with different cross-section and etch depth. Our results show excellent agreement with finite-element analysis simulations for all considered parameters. The experimental data thus allows for optimizing absorption properties of emerging single-photon detectors co-integrated with telecom wavelength optical circuits.
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Pernice, W. H. P., Schuck, C., Minaeva, O., Li, M., Goltsman, G. N., Sergienko, A. V., et al. (2012). High-speed and high-efficiency travelling wave single-photon detectors embedded in nanophotonic circuits. Nat. Commun., 3, 1325 (1 to 10).
Abstract: Ultrafast, high-efficiency single-photon detectors are among the most sought-after elements in modern quantum optics and quantum communication. However, imperfect modal matching and finite photon absorption rates have usually limited their maximum attainable detection efficiency. Here we demonstrate superconducting nanowire detectors atop nanophotonic waveguides, which enable a drastic increase of the absorption length for incoming photons. This allows us to achieve high on-chip single-photon detection efficiency up to 91% at telecom wavelengths, repeatable across several fabricated chips. We also observe remarkably low dark count rates without significant compromise of the on-chip detection efficiency. The detectors are fully embedded in scalable silicon photonic circuits and provide ultrashort timing jitter of 18 ps. Exploiting this high temporal resolution, we demonstrate ballistic photon transport in silicon ring resonators. Our direct implementation of a high-performance single-photon detector on chip overcomes a major barrier in integrated quantum photonics.
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Nasr, M. B., Minaeva, O., Goltsman, G. N., Sergienko, A. V., Saleh, B. E., & Teich, M. C. (2008). Submicron axial resolution in an ultrabroadband two-photon interferometer using superconducting single-photon detectors. Opt. Express, 16(19), 15104–15108.
Abstract: We generate ultrabroadband biphotons via the process of spontaneous parametric down-conversion in a quasi-phase-matched nonlinear grating that has a linearly chirped poling period. Using these biphotons in conjunction with superconducting single-photon detectors (SSPDs), we measure the narrowest Hong-Ou-Mandel dip to date in a two-photon interferometer, having a full width at half maximum (FWHM) of approximately 5.7 fsec. This FWHM corresponds to a quantum optical coherence tomography (QOCT) axial resolution of 0.85 µm. Our results indicate that a high flux of nonoverlapping biphotons may be generated, as required in many applications of nonclassical light.
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Sidorova, M., Semenov, A., Korneev, A., Chulkova, G., Korneeva, Y., Mikhailov, M., et al. (2018). Electron-phonon relaxation time in ultrathin tungsten silicon film. arXiv:1607.07321v1 [physics.ins-det]. Retrieved May 19, 2024, from https://arxiv.org/abs/1607.07321v1
Abstract: Using amplitude-modulated absorption of sub-THz radiation (AMAR) method, we studied electron-phonon relaxation in thin disordered films of tungsten silicide. We found a response time ~ 800 ps at critical temperature Tc = 3.4 K, which scales as minus 3 in the temperature range from 1.8 to 3.4 K. We discuss mechanisms, which can result in a strong phonon bottle-neck effect in a few nanometers thick film and yield a substantial difference between the measured time, characterizing response at modulation frequency, and the inelastic electron-phonon relaxation time. We estimate the electron-phonon relaxation time to be in the range ~ 100-200 ps at 3.4 K.
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Sidorova, M. V., Kozorezov, A. G., Semenov, A. V., Korneev, A. A., Chulkova, G. M., Korneeva, Y. P., et al. (2018). Non-bolometric bottleneck in electron-phonon relaxation in ultra-thin WSi film. arXiv:1607.07321v4 [physics.ins-det]. Retrieved May 19, 2024, from https://arxiv.org/abs/1607.07321v4
Abstract: We developed the model of the internal phonon bottleneck to describe the energy exchange between the acoustically soft ultrathin metal film and acoustically rigid substrate. Discriminating phonons in the film into two groups, escaping and nonescaping, we show that electrons and nonescaping phonons may form a unified subsystem, which is cooled down only due to interactions with escaping phonons, either due to direct phonon conversion or indirect sequential interaction with an electronic system. Using an amplitude-modulated absorption of the sub-THz radiation technique, we studied electron-phonon relaxation in ultrathin disordered films of tungsten silicide. We found an experimental proof of the internal phonon bottleneck. The experiment and simulation based on the proposed model agree well, resulting in tau{e-ph} = 140-190 ps at TC = 3.4 K, supporting the results of earlier measurements by independent techniques.
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