|
|
Merkel, H. F., Khosropanah, P., Sigfrid Yngvesson, K., Cherednichenko, S., Kroug, M., Adam, A., et al. (2001). An active zone small signal model for hot-electron bolometric mixers. In Proc. 12th Int. Symp. Space Terahertz Technol. (55). San Diego, CA, USA.
|
|
|
|
Uzawa, Y., Miki, S., Wang, Z., Kawakami, A., Kroug, M., Yagoubov, P., et al. (2002). Performance of a quasi-optical NbN hot-electron bolometric mixer at terahertz frequencies. Supercond. Sci. Technol., 15(1), 141–145.
|
|
|
|
Kroug, M., Yagoubov, P., Gol'tsman, G., & Kollberg, E. (1997). NbN quasioptical phonon cooled hot electron bolometric mixers at THz frequencies. In Inst. Phys. Conf. Ser. (Vol. 1, pp. 405–408). Bristol.
|
|
|
|
Merkel, H. F., Yagoubov, P. A., Kroug, M., Khosropanah, P., Kollberg, E. L., Gol’tsman, G. N., et al. (1998). Noise temperature and absorbed LO power measurement methods for NbN phonon-cooled hot electron bolometric mixers at terahertz frequencies. In Proc. 28th European Microwave Conf. (Vol. 1, pp. 294–299).
Abstract: In this paper the absorbed LO power requirements and the noise performance of NbN based phonon-cooled hot electron bolometric (HEB) quasioptical mixers are investigated for RF frequencies in the 0.55-1.1 range The minimal measured DSB noise temperatures are about 500 K at 640 GHz, 600 K at 750 GHz, 850 K at 910 GHz and 1250 K at 1.1 THz. The increase in noise temperature at 1.1THz is attributed to water absorption. The absorbed LO power is measured using a calorimetric approach. The results are subsequently corrected for lattice heating. These values are compared to results of a novel one dimensional hot spot mixer models and to a more traditional isotherm method which tends to underestimate the absorbed LO power for small bias powers. Typically a LO power between 50nW and 100nW is needed to pump the device to the optimal operating point.
|
|
|
|
Yagoubov, P., Kroug, M., Merkel, H., Kollberg, E., Schubert, J., Hubers, H. W., et al. (1999). Hot electron bolometric mixers based on NbN films deposited on MgO substrates. In Inst. Phys. Conf. Ser. (Vol. 167, pp. 687–690). Barcelona, Spain.
|
|
