Gershenzon, E. M., Gol'tsman, G. N., Dzardanov, A. L., Elant'ev, A. I., Zorin, M. A., Markin, A. G., et al. (1992). S-N switching of niobium and YBCO films: limit time and perspective of fast key element creation. Sverkhprovodimost': Fizika, Khimiya, Tekhnika, 5(12), 2386–2402.
Abstract: A study was made on processes of switching of thin niobium film strips between superconducting and normal states under the effect of optical radiation pulse and voltage step. The results are described satisfactorily by the model of spatial homogeneous electron heating. It is shown that limiting switching times can be equal to several shares of nanosecond at 4.2 K. Preliminary results for YBa2Cu3O-7-x films are presented. Prospects and advantages of creation of ducting structures of narrow streps, are discussed.
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Erickson, N. R. (1992). Low-noise submillimeter receivers using single-diode harmonic mixers. In Proc. IEEE (Vol. 80, pp. 1721–1728).
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Crowe, T. W., Mattauch, R. J., Roser, H. P., Bishop, W. L., Peatman, W. C. B., & Liu, X. (1992). GaAs Schottky diodes for THz mixing applications. In Proc. IEEE (Vol. 80, pp. 1827–1841).
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Budyanskij, M. Y., Sejdman, L. A., Voronov, B. M., & Gubkina, T. O. (1992). Increase of reproducibility in production of superconducting thin films of niobium nitride. Sverkhprovodimost': Fizika, Khimiya, Tekhnika, 5(10), 1950–1954.
Abstract: Technique to control the composition of gas medium in the reactive magnetron discharge and the composition of the deposited films of niobium nitride using electrical parameters of discharge only, in particular, by δU = Up – Uar value at contant stabilized discharge current is described. Technique to select optimal condition for deposition of niobium nitride films when the films have composition meeting chemical formula, is suggested. Thin films of niobium nitride with up to 7 nm thickness and with rather high temperature of transition into superconducting state Tk > 10 K) and with low width of transition (δ < 0.6 K), are obtained. It is determined, that substrate material and dielectric sublayer do not affect. Tk value, while difference in coefficients of thermal expansion of substrate and of film affects δTk value.
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