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Kenyon, M., Day, P. K., Bradford, C. M., Bock, J. J., & Leduc, H. G. (2006). Background-limited membrane-isolated TES bolometers for far-IR/submillimeter direct-detection spectroscopy. Nucl. Instr. & Meth. Phys. Res. A, 559, 456–458.
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Yagoubov, P., Hoogeveen, R., Torgashin, M., Khudchenko, A., Koshelets, V., Suttiwong, N., et al. (2006). 550-650 GHz spectrometer development for TELIS. In Proc. 17th Int. Symp. Space Terahertz Technol. (pp. 338–341).
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McDonald, P. C., Jaramillo, E., & Baudouy, B. (2006). Thermal design of the CFRP support struts for the spatial framework of the Herschel Space Observatory. Cryogenics, 46(4), 298–304.
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Gol'tsman, G., Maslennikov, S., Finkel, M., Antipov, S., Kaurova, N., Grishina, E., et al. (2006). Nanostructured ultrathin NbN film as a terahertz hot-electron bolometer mixer. In Proc. MRS (Vol. 935, 210 (1 to 6)).
Abstract: Planar spiral antenna coupled and directly lens coupled NbN HEB mixer structures are studied. An additional MgO buffer layer between the superconducting film and Si substrate is introduced. The buffer layer enables us to increase the gain bandwidth of a HEB mixer due to better acoustic transparency. The gain bandwidth is widened as NbN film thickness decreases and amounts to 5.2 GHz. The noise temperature of antenna coupled mixer is 1300 and 3100 K at 2.5 and 3.8 THz respectively. The structure and composition of NbN films is investigated by X-ray diffraction spectroscopy methods. Noise performance degradation at LO frequencies more than 3 THz is due to the use of a planar antenna and signal loss in contacts between the antenna and the sensitive NbN bridge. The mixer is reconfigured for operation at higher frequencies in a manner that receiver’s noise temperature is only 2300 K (3 times of quantum limit) at LO frequency of 30 THz.
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Gao, J. R., Hajenius, M., Tichelaar, F. D., Voronov, B., Grishina, E., Klapwijk, T. M., et al. (2006). Can NbN films on 3C-SiC/Si change the IF bandwidth of hot electron bolometer mixers? In Proc. 17th Int. Symp. Space Terahertz Technol. (pp. 187–189).
Abstract: We realized ultra thin NbN films sputtered grown on a 3C-SiC/Si substrate. The film with a thickness of 3.5-4.5 nm shows a 1', of 11.8 K, which is the highest I`, observed among ultra thin NbN films on different substrates. The high-resolution transmission electron microscopy (HRTEM) studies show that the film has a monocrystalline structure, confirming the epitaxial growth on the 3C-SiC. Based on a two-temperature model and input parameters from standard NbN films on Si, simulations predict that the new film can increase the IF bandwidth of a HEB mixer by about a factor of 2 in comparison to the standard films. In addition, we find standard NbN films on Si with a T c of 9.4 K have a thickness of around 5.5 nm, being thicker than expected (3.5 nm).
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