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Elmanov I, Elmanova A, Komrakova S, Golikov A, Kaurova N, Kovalyuk V, et al. Method for determination of resists parameters for photonic – integrated circuits e-beam lithography on silicon nitride platform. In: EPJ Web Conf. Vol 220.; 2019. 03012.
Abstract: In the work the thicknesses of the e-beam resists ZEP 520A and ma-N 2400 by using non-destructive method were measured, as well as recipe for the high ratio between the Si3N4 and the resists etching rate was determined. The work has a practical application for e-beam lithography of photonic-integrated circuits and nanophotonics devices based on silicon nitride platform.
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