TY  - JOUR
AU  - Baeva, E. M.
AU  - Titova, N. A.
AU  - Kardakova, A. I.
AU  - Piatrusha, S. U.
AU  - Khrapai, V. S.
PY  - 2020
DA  - 2020//
TI  - Universal bottleneck for thermal relaxation in disordered metallic films
T2  - Jetp Lett.
JO  - JETP Lett.
SP  - 104
EP  - 108
VL  - 111
IS  - 2
KW  - NbN disordered metallic films
KW  - thermal relaxation
AB  - We study the heat relaxation in current biased metallic films in the regime of strong electron–phonon coupling. A thermal gradient in the direction normal to the film is predicted, with a spatial temperature profile determined by the temperature-dependent heat conduction. In the case of strong phonon scattering, the heat conduction occurs predominantly via the electronic system and the profile is parabolic. This regime leads to the linear dependence of the noise temperature as a function of bias voltage, in spite of the fact that all the dimensions of the film are large compared to the electron–phonon relaxation length. This is in stark contrast to the conventional scenario of relaxation limited by the electron–phonon scattering rate. A preliminary experimental study of a 200-nm-thick NbN film indicates the relevance of our model for materials used in superconducting nanowire single-photon detectors.
SN  - 0021-3640
UR  - https://link.springer.com/10.1134/S0021364020020034
UR  - https://doi.org/10.1134/S0021364020020034
DO  - 10.1134/S0021364020020034
N1  - exported from refbase (https://db.rplab.ru/refbase/show.php?record=1164), last updated on Fri, 30 Apr 2021 22:00:01 -0500
ID  - Baeva_etal2020
ER  -