%0 Conference Proceedings
%T Influence of sputtering parameters on the main characteristics of ultra-thin vanadium nitride films
%A Zolotov, P. I.
%A Divochiy, A. V.
%A Vakhtomin, Y. B.
%A Lubenchenko, A. V.
%A Morozov, P. V.
%A Shurkaeva, I. V.
%A Smirnov, K. V.
%S J. Phys.: Conf. Ser.
%D 2018
%V 1124
%@ 1742-6588
%F Zolotov_etal2018
%O exported from refbase (https://db.rplab.ru/refbase/show.php?record=1228), last updated on Mon, 03 May 2021 23:06:55 -0500
%X We researched the relation between deposition and ultra-thin VN films parameters. To conduct the experimental study we varied substrate temperature, Ar and N2 partial pressures and deposition rate. The study allowed us to obtain the films with close to the bulk values transition temperatures and implement such samples in order to fabricate superconducting single-photon detectors.
%K SSPD
%K SNSPD
%K VN
%R 10.1088/1742-6596/1124/5/051030
%U https://iopscience.iop.org/article/10.1088/1742-6596/1124/5/051030
%U https://doi.org/10.1088/1742-6596/1124/5/051030
%P 051030