TY  - CONF
AU  - Zolotov, P. I.
AU  - Divochiy, A. V.
AU  - Vakhtomin, Y. B.
AU  - Lubenchenko, A. V.
AU  - Morozov, P. V.
AU  - Shurkaeva, I. V.
AU  - Smirnov, K. V.
PY  - 2018
DA  - 2018//
TI  - Influence of sputtering parameters on the main characteristics of ultra-thin vanadium nitride films
T2  - J. Phys.: Conf. Ser.
BT  - J. Phys.: Conf. Ser.
SP  - 051030
VL  - 1124
KW  - SSPD
KW  - SNSPD
KW  - VN
AB  - We researched the relation between deposition and ultra-thin VN films parameters. To conduct the experimental study we varied substrate temperature, Ar and N2 partial pressures and deposition rate. The study allowed us to obtain the films with close to the bulk values transition temperatures and implement such samples in order to fabricate superconducting single-photon detectors.
SN  - 1742-6588
UR  - https://iopscience.iop.org/article/10.1088/1742-6596/1124/5/051030
UR  - https://doi.org/10.1088/1742-6596/1124/5/051030
DO  - 10.1088/1742-6596/1124/5/051030
N1  - exported from refbase (https://db.rplab.ru/refbase/show.php?record=1228), last updated on Mon, 03 May 2021 23:06:55 -0500
ID  - Zolotov_etal2018
ER  -