TY  - STD
AU  - Sidorova, M. V.
AU  - Kozorezov, A. G.
AU  - Semenov, A. V.
AU  - Korneev, A. A.
AU  - Chulkova, G. M.
AU  - Korneeva, Y. P.
AU  - Mikhailov, M. Y.
AU  - Devizenko, A. Y.
AU  - Goltsman, G. N.
PY  - 2018
DA  - 2018//
TI  - Non-bolometric bottleneck in electron-phonon relaxation in ultra-thin WSi film
KW  - WSi films
KW  - diffusion constant
KW  - SSPD
KW  - SNSPD
AB  - We developed the model of the internal phonon bottleneck to describe the energy exchange between the acoustically soft ultrathin metal film and acoustically rigid substrate. Discriminating phonons in the film into two groups, escaping and nonescaping, we show that electrons and nonescaping phonons may form a unified subsystem, which is cooled down only due to interactions with escaping phonons, either due to direct phonon conversion or indirect sequential interaction with an electronic system. Using an amplitude-modulated absorption of the sub-THz radiation technique, we studied electron-phonon relaxation in ultrathin disordered films of tungsten silicide. We found an experimental proof of the internal phonon bottleneck. The experiment and simulation based on the proposed model agree well, resulting in tau_{e-ph} = 140-190 ps at T_C = 3.4 K, supporting the results of earlier measurements by independent techniques.
UR  - https://arxiv.org/abs/1607.07321v4
N1  - Duplicated as 1305
ID  - Sidorova_etal2018
ER  -