@Article{Kardakova_etal2013,
author="Kardakova, A.
and Finkel, M.
and Morozov, D.
and Kovalyuk, V.
and An, P.
and Dunscombe, C.
and Tarkhov, M.
and Mauskopf, P.
and Klapwijk, T. M.
and Goltsman, G.",
title="The electron-phonon relaxation time in thin superconducting titanium nitride films",
journal="Appl. Phys. Lett.",
year="2013",
volume="103",
number="25",
pages="252602 (1 to 4)",
optkeywords="disordered TiN films; electron-phonon relaxation time",
abstract="We report on the direct measurement of the electron-phonon relaxation time, $\tau$eph, in disordered TiN films. Measured values of $\tau$eph are from 5.5{\thinspace}ns to 88{\thinspace}ns in the 4.2 to 1.7{\thinspace}K temperature range and consistent with a T-3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.The work was supported by the Ministry of Education and Science of the Russian Federation, Contract No. 14.B25.31.0007 and by the RFBR Grant No. 13-02-91159.",
optnote="exported from refbase (https://db.rplab.ru/refbase/show.php?record=941), last updated on Thu, 13 May 2021 14:35:05 -0500",
doi="10.1063/1.4851235",
opturl="https://doi.org/10.1063/1.4851235"
}