%0 Journal Article
%T The electron-phonon relaxation time in thin superconducting titanium nitride films
%A Kardakova, A.
%A Finkel, M.
%A Morozov, D.
%A Kovalyuk, V.
%A An, P.
%A Dunscombe, C.
%A Tarkhov, M.
%A Mauskopf, P.
%A Klapwijk, T. M.
%A Goltsman, G.
%J Appl. Phys. Lett.
%D 2013
%V 103
%N 25
%F Kardakova_etal2013
%O exported from refbase (https://db.rplab.ru/refbase/show.php?record=941), last updated on Thu, 13 May 2021 14:35:05 -0500
%X We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T−3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.The work was supported by the Ministry of Education and Science of the Russian Federation, Contract No. 14.B25.31.0007 and by the RFBR Grant No. 13-02-91159.
%K disordered TiN films
%K electron-phonon relaxation time
%R 10.1063/1.4851235
%U https://doi.org/10.1063/1.4851235
%P 252602 (1 to 4)