PT Journal
AU Kardakova, A
   Finkel, M
   Morozov, D
   Kovalyuk, V
   An, P
   Dunscombe, C
   Tarkhov, M
   Mauskopf, P
   Klapwijk, TM
   Goltsman, G
TI The electron-phonon relaxation time in thin superconducting titanium nitride films
SO Appl. Phys. Lett.
JI Appl. Phys. Lett.
PY 2013
BP 252602 (1 to 4)
VL 103
IS 25
DI 10.1063/1.4851235
DE disordered TiN films; electron-phonon relaxation time
AB We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T−3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.The work was supported by the Ministry of Education and Science of the Russian Federation, Contract No. 14.B25.31.0007 and by the RFBR Grant No. 13-02-91159.
ER