TY  - JOUR
AU  - Kardakova, A.
AU  - Finkel, M.
AU  - Morozov, D.
AU  - Kovalyuk, V.
AU  - An, P.
AU  - Dunscombe, C.
AU  - Tarkhov, M.
AU  - Mauskopf, P.
AU  - Klapwijk, T. M.
AU  - Goltsman, G.
PY  - 2013
DA  - 2013//
TI  - The electron-phonon relaxation time in thin superconducting titanium nitride films
T2  - Appl. Phys. Lett.
JO  - Appl. Phys. Lett.
SP  - 252602 (1 to 4)
VL  - 103
IS  - 25
KW  - disordered TiN films
KW  - electron-phonon relaxation time
AB  - We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T−3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.The work was supported by the Ministry of Education and Science of the Russian Federation, Contract No. 14.B25.31.0007 and by the RFBR Grant No. 13-02-91159.
UR  - https://doi.org/10.1063/1.4851235
DO  - 10.1063/1.4851235
N1  - exported from refbase (https://db.rplab.ru/refbase/show.php?record=941), last updated on Thu, 13 May 2021 14:35:05 -0500
ID  - Kardakova_etal2013
ER  -