| Records |
| Author |
Gershenzon, E. M.; Gershenzon, M. E.; Gol'tsman, G. N.; Semyonov, A. D.; Sergeev, A. V. |
| Title |
Heating of electrons in superconductor in the resistive state due to electromagnetic radiation |
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Journal Article |
Year  |
1984 |
Publication |
Solid State Communications |
Abbreviated Journal |
Solid State Communications |
| Volume |
50 |
Issue |
3 |
Pages |
207-212 |
| Keywords |
Nb HEB |
| Abstract |
The effect of heating electrons with respect to phonons in a thin superconducting film driven into the resistive state by the current and the external magnetic field has been observed and investigated. This effect caused by the electromagnetic radiation is manifested in the increased resistance of the film and is not selective over the frequency range from 1010 to 1015 Hz. That the effect is frequency independent under the conditions of strong electron scattering caused by static defects is explained by the decisive role of electron -electron collisions in forming the distribution function. The characteristic time of resistance change, obtained experimentally, corresponds to the relaxation time of the order parameter near the superconducting transition and to the relaxation time of the nonelastic electron-phonon interaction at lower temperatures and in lower magnetic fields. |
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0038-1098 |
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Algie L. L., Wendell D. S. and Labaar F. |
| Title |
Phase noise and AM noise measurements in the frequency domain |
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Journal Article |
| Year |
1984 |
Publication |
Infared and milimetres waves |
Abbreviated Journal |
Academic Press. |
| Volume |
11 |
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239-289 |
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RPLAB @ atomics90 @ |
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1002 |
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Гершензон, Е. М.; Семенов, И. Т.; Фогельсон, М. С. |
| Title |
О механизме динамического сужения линии ЭПР доноров фосфора в кремнии |
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Journal Article |
| Year |
1984 |
Publication |
Физика и техника полупроводников |
Abbreviated Journal |
Физика и техника полупроводников |
| Volume |
18 |
Issue |
3 |
Pages |
421-425 |
| Keywords |
Si, phosphorus donors, EPR |
| Abstract |
Температурная зависимость ширины линии ЭПР доноров Р в Si исследована в интервале концентрации ND=2.5⋅1017−9⋅1017см−3 и температур T=1.7−45 K на образцах с различной степенью компенсации основной примеси. Результаты согласуются с моделью обменного сужения линии при учете температурной зависимости обменного интеграла и тем самым исключают предлагавшийся ранее механизм сужения линии вследствие прыжкового движения электронов по примесным центрам. |
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