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Author Wang, Zhen; Miki, S.; Fujiwara, M.
Title Superconducting nanowire single-photon detectors for quantum information and communications Type Journal Article
Year 2009 Publication IEEE J. Sel. Topics Quantum Electron. Abbreviated Journal
Volume 15 Issue 6 Pages 1741-1747
Keywords SSPD
Abstract Superconducting nanowire single-photon detectors (SNSPDs or SSPD) are highly promising devices in the growing field of quantum information and communications technology. We have developed a practical SSPD system with our superconducting thin films and devices fabrication, optical coupling packaging, and cryogenic technology. The SSPD system consists of six-channel SSPD devices and a compact Gifford-McMahon (GM) cryocooler, and can operate continuously on 100 V ac power without the need for any cryogens. The SSPD devices were fabricated from high-quality niobium nitride (NbN) ultrathin films that were epitaxially grown on single-crystal MgO substrates. The packaged SSPD devices were temperature stabilized to 2.96 K ± 10 mK. The system detection efficiency for an SSPD device with an area of 20 × 20 ¿m2 was found to be 2.6% and 4.5% at wavelengths of 1550 and 1310 nm, respectively, at a dark count rate of 100 Hz, and a jitter of 100 ps full-width at half maximum. We also performed ultrafast BB84 quantum key distribution (QKD) field testing and entanglement-based QKD experiments using these SSPD devices.
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Call Number RPLAB @ gujma @ Serial 676
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Author Yang, J.K.W.; Kerman, A.J.; Dauler, E.A.; Cord, B.; Anant, V.; Molnar, R.J.; Berggren, K.K.
Title Suppressed critical current in superconducting nanowire single-photon detectors with high fill-factors Type Journal Article
Year 2009 Publication IEEE Trans. Appl. Supercond. Abbreviated Journal
Volume 19 Issue 3 Pages 318-322
Keywords SNSPD
Abstract In this work we present a new fabrication process that enabled the fabrication of superconducting nanowire single photon detectors SNSPD with fill-factors as high as 88% with gaps between nanowires as small as 12 nm. This fabrication process combined high-resolution electron-beam lithography with photolithography. Although this work was motivated by the potential of increased detection efficiency with higher fill-factor devices, test results showed an unexpected systematic suppression in device critical currents with increasing fill-factor.
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Call Number RPLAB @ gujma @ Serial 677
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Author Hu, Xiaolong; Zhong, Tian; White, James E.; Dauler, Eric A. Najafi, Faraz; Herder, Charles H.; Wong, Franco N. C.; Berggren, Karl K.
Title Fiber-coupled nanowire photon counter at 1550 nm with 24% system detection efficiency Type Journal Article
Year 2009 Publication Optics Letters Abbreviated Journal Opt. Lett.
Volume 34 Issue 23 Pages 3607-3609
Keywords SNSPD
Abstract We developed a fiber-coupled superconducting nanowire single-photon detector system in a close-cycled cryocooler and achieved 24% and 22% system detection efficiencies at wavelengths of 1550 and 1315 nm, respectively. The maximum dark count rate was ~1000 counts/s.
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Call Number RPLAB @ gujma @ Serial 679
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Author Kerman, Andrew J.; Yang, Joel K. W.; Molnar, Richard J.; Dauler, Eric A.; Berggren, Karl K.
Title Electrothermal feedback in superconducting nanowire single-photon detectors Type Journal Article
Year 2009 Publication Phys. Rev. B Abbreviated Journal Phys. Rev. B
Volume 79 Issue 10 Pages 4
Keywords SNSPD
Abstract We investigate the role of electrothermal feedback in the operation of superconducting nanowire single-photon detectors (SNSPDs). It is found that the desired mode of operation for SNSPDs is only achieved if this feedback is unstable, which happens naturally through the slow electrical response associated with their relatively large kinetic inductance. If this response is sped up in an effort to increase the device count rate, the electrothermal feedback becomes stable and results in an effect known as latching, where the device is locked in a resistive state and can no longer detect photons. We present a set of experiments which elucidate this effect and a simple model which quantitatively explains the results.
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Call Number RPLAB @ gujma @ Serial 680
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Author Venkatasubramanian, Chandrasekaran; Cabarcos, Orlando M.; Allara, David L. Horn, Mark W.; Ashok, S.
Title Correlation of temperature response and structure of annealed VOx thin films for IR detector applications Type Journal Article
Year 2009 Publication J. Vac. Sci. Technol. A Abbreviated Journal
Volume 27 Issue 4 Pages 6
Keywords Annealing
Abstract The effects of thermal annealing on vanadium oxide (VOx) thin films prepared by pulsed-dc magnetron sputtering were studied to explore methods of improving the efficiency of uncooled IR imaging microbolometers, particularly with respect to maximizing the temperature coefficients of resistance (TCR) (typically ~2%) while minimizing resistivity values (typically 0.05–5 Ω cm). Since high TCR values are usually associated with high resistivities, the experiments were designed to find processing conditions that provide an optimal balance in these properties and to then determine the underlying structural correlations which would enable rational design of thin films for this specific application. VOx films of different compositions were deposited by pulsed-dc reactive sputtering from a vanadium target at different oxygen flow rates. The deposited films were further modified by annealing in inert (nitrogen) and oxidizing (oxygen) atmospheres at four different temperatures for 10, 20, or 30 min at a time. The resistivities of the as-deposited films ranged from 0.2 to 13 Ω cm and the TCR values varied from –1.6% to –2.2%. Depending on the exact annealing conditions, several orders of magnitude change in resistance and significant variations in TCR were observed. Optimal results were obtained with annealing in a nitrogen atmosphere. Structural characterization by x-ray diffraction, field emission scanning electron microscopy, atomic force microscopy, and Raman spectroscopy indicated changes in the film crystallinity and phase for annealing conditions over 300 °C with the onset and extent of the changes dependent on which annealing atmosphere was used.
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Notes Annealing Approved no
Call Number RPLAB @ gujma @ Serial 690
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